2023

59. Na2ZrFe(PO4)3─A Rhombohedral NASICON-Structured Material: Synthesis, Structure and Na-Intercalation Behavior, Anil K Paidi, Ankur Sharma, Vinod K Paidi, Mani Pujitha Illa, Kug-Seung Lee, Sangsul Lee, Docheon Ahn, Amartya Mukhopadhyay, Inorganic Chemistry

58. Dendritic Polyphenol with an Improved Glass Transition Temperature for Microelectronic Applications, Jeong-Seok Mun, Ji-Hoon Woo, Yejin Ku, Hyun-Taek Oh, Jin Hyun Lee, Jin-Kyun Lee, Kanghyun Kim, Byeong-Gyu Park, Sangsul Lee,  ACS Materials Letters, accepted 

57. Extreme UV Resist Exhibiting Synergism between Chemical and Physical Crosslinking Mechanisms, Yejin Ku, KangHyun Kim, Hyun-Taek Oh, Byeong-Gyu Park, Sangsul Lee, Jin-Kyun Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim, Langmuir 39, 3462-3470

​

2022

56. Near-field infrared nanoscopic study of EUV-and e-beam-exposed hydrogen silsesquioxane photoresist, Jiho Kim, Jin-Kyun Lee, Boknam Chae, Jinho Ahn, Sangsul Lee, Nano Convergence 9 (1), 1-10

55. In situ observation of an atomically modified glassy carbon surface: From synthesis of an Fe-N-C catalyst to intrinsic combined reactions of hydrogen dissociation and the oxygen reduction reaction, G Kim, S Noh, S Lee, K Lee, K Kim, Diamond and Related Materials 130, 109464

54. Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure, DH Kwon, HG Kang, TG Kim, JH Ahn, SS Lee, JG Park, Photomask Technology 2022 12293, 79-85

53. Perfluoroalkylated metallophthalocyanines as EUV resist candidates, Yejin Ku, Jun-il Kim, Hyun-Taek Oh, Youngtae Kim, Minkyu Choi, Jin-Kyun Lee, Kang-Hyun Kim, Byeong-Gyu Park, Sangsul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim, Advances in Patterning Materials and Processes XXXIX 12055, 92-100

52. The effect of high-temperature storage on the reaction heterogeneity of Ni-rich layered cathode materials, Eunkang Lee, Wontae Lee, Jaeyoung Kim, Hyunwoo Kim, Minji Kim, Soyeong Yun, Sangsul Lee, Junsik Kim, Dohyung Park, Donghan Kim, Won-Sub Yoon, Energy Storage Materials 46, 259-268

51. Effect of thermal annealing on the film and substrate/film interface: the case of ZnFe2O4, Singh Jitendra Pal, Nandy Subhajit, Kim So Hee, Lim Weon Cheol, Lee Sangsul, Chae Keun Hwa, Applied Nanoscience

50. Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA, K Kim, JW Lee, BG Park, HT Oh, Y Ku, JK Lee, G Lim, S Lee, RSC advances 12, 2589-2594

Synchrotron radiation based X-ray techniques for analysis of cathodes in Li rechargeable batteries, JP 49. Singh, AK Paidi, KH Chae, S Lee, D Ahn, RSC advances 12 (31), 20360-20378

X-ray Absorption Spectroscopy for Estimation of Oxidation State, Chemical Fraction and Local Atomic Structure of Materials, JP Singh, S Nandy, KH Chae, S Lee, Prabha Materials Science Letters

​​

2021

48. Fe+ and Zn+ ion implantation in MgO single crystals, JP Singh, WC Lim, J Song, S Lee, KH Chae, Materials Letters 301, 130232

47. Guest Editor: Creation, control and investigation of defects in do ferromagnetic materials, J Pal Singh, S Lee, KH Chae, Vacuum 190, 110079

46. Universal alignment of graphene oxide in suspensions and fibers, YH Shim, H Ahn, S Lee, SO Kim, SY Kim, ACS nano 15 (8), 13453-13462

45. Patent: X-ray shutter apparatus and X-ray shutter opening and closing system using the same, HY Kim, HS Kim, J Lim, DT Jeong, SS Lee, JH Kim, US Patent 11,017,912

44. Calcite nanocrystals investigated using X-ray absorption spectroscopy, V Singh, AK Paidi, CH Shim, SH Kim, SO Won, JP Singh, S Lee, KH Chae, Crystals 11 (5), 490

43. Highly fluorinated alternating copolymers possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation, YJ Ku, HT Oh, K Kim, BG Park, S Lee, JK Lee, Advances in Patterning Materials and Processes XXXVIII 11612, 116-124

42. Perfluoroalkylated alternating copolymer possessing solubility in fluorous liquids and imaging capabilities under high energy radiation, Hyun-Taek Oh, Seok-Heon Jung, Kang-Hyun Kim, Yina Moon, Do Hyeon Jeong, Yejin Ku, Sangsul Lee, Byeong-Gyu Park, Jiyoul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim, Jin-Kyun Lee, RSC advances 11 (3), 1517-1523

​​

2020

41. MgO thin film growth on Si (001) by radio-frequency sputtering method, JP Singh, M Kumar, WC Lim, HH Lee, YM Lee, S Lee, KH Chae, Journal of Nanoscience and Nanotechnology 20 (12), 7530-7534

40. Zernike phase-contrast full-field transmission X-ray nanotomography for 400 micrometre-sized samples, JY Park, Y Kim, S Lee, J Lim, Journal of Synchrotron Radiation 27 (6), 1696-1702

39. Local Electronic Structure of Calcite Investigated Using X-ray Absorption Spectroscopy at Different Span of Time, V Singh, JP Singh, CH Shim, S Lee, KH Chae, Journal of Nanoscience and Nanotechnology 20 (11), 6713-6717

38. X-ray nanotomography of dry colloidal packings, Y Kim, S Lee, J Lim, BM Weon, Scientific Reports 10 (1), 17222

37. Approaches to synthesize MgO nanostructures for diverse applications, JP Singh, V Singh, A Sharma, G Pandey, KH Chae, S Lee, Heliyon 6 (9), e04882

36. 3D structural analysis of PI blend/BN composite film with FTIR spectro-microtomography, J Kim, JY Park, HJ Kim, S Lee, Y Shin, SW Lee, B Chae, Vibrational Spectroscopy 110, 103144

35. Demonstration of a ring-FEL as an EUV lithography tool, J Lee, G Jang, J Kim, B Oh, DE Kim, SS Lee, JH Kim, J Ko, C Min, S Shin, Journal of Synchrotron Radiation 27 (4), 864-869

34. Soft X-ray Absorption Spectroscopic Investigation of Li(Ni0.8Co0.1Mn0.1)O2 Cathode Materials, JP Singh, JY Park, KH Chae, D Ahn, S Lee, Nanomaterials 10 (4), 759​​

33. Molecular resists equipped with fluorinated aromatic units for electron-beam and extreme UV lithography, HT Oh, K Kim, BG Park, S Lee, JK Lee, Advances in Patterning Materials and Processes XXXVII 11326, 47-53

32. Development of XANES nanoscopy on BL7C at PLS-II, JY Park, JP Singh, J Lim, S Lee, Journal of Synchrotron Radiation 27 (2), 545-550

31. Book chapter: Bottom-up and top-down approaches for MgO, JP Singh, M Kumar, A Sharma, G Pandey, KH Chae, S Lee, Sonochemical Reactions

30. Li (Ni1/3Co1/3Mn1/3) O2 cathode investigated using X-ray absorption spectroscopy and transmission X-ray microscopy, JY Park, JP Singh, C Jung, JH Park, J Lim, KH Chae, S Lee, Materials Letters 261, 126983

29. Correlating the size and cation inversion factor in context of magnetic and optical behavior of CoFe 2 O 4 nanoparticles, Jitendra Pal Singh, Jae Yeon Park, Varsha Singh, So Hee Kim, Weon Cheol Lim, Hemaunt Kumar, YH Kim, Sangsul Lee, Keun Hwa Chae, RSC advances 10 (36), 21259-21269

​​

~2019

28. Design of zinc ferrite thin films with excess tetrahedrally coordinated Fe3+ ions and their magnetic interactions, JP Singh, S Lee, KH Chae, Vacuum 168, 108848

27. X-ray-powered micromotors, Z Xu, M Chen, H Lee, SP Feng, JY Park, S Lee, JT Kim, ACS applied materials & interfaces 11 (17), 15727-15732

26. Imaging behavior of highly fluorinated molecular resists under extreme UV radiation, H Oh, SH Jung, JS Mun, K Kim, S Lee, JK Lee, Advances in Patterning Materials and Processes XXXVI 10960, 102-108

25. Patent: Imaging system in reflection mode using coherent diffraction imaging methods and using micro-pinhole and aperture system, Y Ekinci, LEE Sangsul, US Patent 10,042,270

24. Variable field of view full field transmission X-ray microscope, J Lim, S Lee, J Park, Y Roh, Y Kim, Microscopy and Microanalysis 24 (S2), 260-261

23. X-ray beam-position feedback system with easy-to-use beam-position monitor, JY Park, Y Kim, S Lee, J Lim, Journal of Synchrotron Radiation 25 (3), 869-873

22. Early commissioning results for spectroscopic X-ray Nano-Imaging Beamline BL 7C sXNI at PLS-II, S Lee, IH Kwon, JY Kim, SS Yang, S Kang, J Lim, Journal of synchrotron radiation 24 (6), 1276-1282

21. A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source, S Lee, M Guizar-Sicairos, Y Ekinci, Proc. SPIE 9048, 904811

20. Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography, S Lee, I Lee, J Gul Doh, J Uk Lee, S Hong, J Ahn,  Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

19. Effect on critical dimension performance for carbon contamination of extreme ultraviolet mask using coherent scattering microscopy and in-situ contamination system, J Doh, S Lee, J Lee, S Hong, CY Jeong, DG Lee, SS Kim, J Ahn, Japanese Journal of Applied Physics 51 (6S), 06FB04

18. Carbon Contamination Analysis and Its Effect on Extreme Ultra Violet Mask Imaging Performance Using Coherent Scattering Microscopy/In-Situ Accelerated Contamination System, Chang Young Jeong, Sangsul Lee, Jong Gul Doh, Jae Uk Lee, Han-sun Cha, William T Nichols, Dong Gun Lee, Seong Sue Kim, Han Ku Cho, Seung-yu Rah, Jinho Ahn, Journal of Nanoscience and Nanotechnology 11 (7), 5717-5722

17. Carbon contamination of EUV mask and its effect on CD performance, S Lee, JG Doh, JU Lee, I Lee, CY Jeong, DG Lee, S Rah, J Ahn, Current Applied Physics 11 (4), S107-S110

16. Principles of photolithography, JH Ahn, SS Lee, Physics and High Technology 20 (2), 1-8

15. Determination of the CD performance and carbon contamination of an EUV mask by using a coherent scattering microscopy/in-situ contamination system, Jonggul Doh, Chang Young Jeong, Sangsul Lee, Jae Uk Lee, Han-sun Cha, Jinho Ahn, Dong Gun Lee, Seong Sue Kim, Han Ku Cho, Seungyu Rah, Journal of the Korean Physical Society 57 (6), 1486-1489

14. Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography, CY Jeong, S Lee, HD Shin, TG Kim, J Ahn, Microelectronic engineering 87 (11), 2134-2138

13. Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography, CY Jeong, S Lee, HD Shin, TG Kim, J Ahn, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

12. Characteristics of Pentacene Organic Field-Effect Transistors with Self-Assembled-Monolayer-Treated HfO2 Gate Oxide, S Lee, SS Lee, JH Park, IS Park, J Ahn, Japanese Journal of Applied Physics 48 (6S), 06FD06

11. Effect of attenuated phase shift mask structure on extreme ultraviolet lithography, HD Shin, CY Jeoung, TG Kim, S Lee, IS Park, J Ahn, Japanese Journal of Applied Physics 48 (6S), 06FA06

10. Mechanically flexible low-leakage multilayer gate dielectrics for flexible organic thin film transistors, YG Seol, HY Noh, SS Lee, JH Ahn, NE Lee, Applied Physics Letters 93 (1), 244

9. The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect, CY Jeong, BH Kim, TG Kim, S Lee, EJ Kim, HK Oh, IS Park, J Ahn, Emerging Lithographic Technologies XII 6921, 1050-1057

8. Effects of additive  during inductively coupled  plasma etching of TaN and  for gate stack patterning, JH Ko, DY Kim, MS Park, NE Lee, SS Lee, J Ahn, H Mok, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

7. Resistance switching characteristics for nonvolatile memory operation of binary metal oxides, IS Park, KR Kim, S Lee, J Ahn, Japanese journal of applied physics 46 (4S), 2172

6. Electrical characteristics of poly (3-hexylthiophene) organic thin film transistor with electroplated metal gate electrodes on polyimide, YG Seol, JG Lee, NE Lee, SS Lee, J Ahn, Thin solid films 515 (12), 5065-5069

5. Low voltage flexible organic thin film transistor with an organic/high-k inorganic multilayer gate dielectric layer, YG Seol, SS Lee, JH An, NE Lee, Proceedings of the Korean Vacuum Society Conference, 108-108

4. Resistive Switching Characteristics of HfO~ 2 Grown by Atomic Layer Deposition, K Kim, I Park, JP Hong, SS Lee, BL Choi, J Ahn, Journal-Korean Physical Society 49, S548

3. Pentacene thin film transistors with an organic/high-k inorganic bilayer gate dielectric layer on flexible substrate, YG Seol, SS Lee, JH An, NE Lee, Proceedings of the Korean Vacuum Society Conference, 173-173

2. Characterization and evaluation of ALD-HfO/sub 2/using H/sub 2/O and D/sub 2/O as an oxidant, T Lee, IS Park, HK Ko, S Lee, KR Kim, J Ahn, Digest of Papers Microprocesses and Nanotechnology 2005, 94-95

1. Study on the  Thin Film Thickness and Post Anneal for the Optical Properties, SS Lee, MI Jang, US Kim, TH Lee, IS Park, JH An, Proceedings of the Materials Research Society of Korea Conference, 243-24